ChemArt has always been a major contributor to the Photo Chemical Machining (PCM) industry since its creation in 1976. Its founder, Dick Beaupre, was the originator of aqueous dry film photo resist used in PCM imaging applications. Currently, all dry film photo resists used in PCM applications are based on his original research. Today, ChemArt utilizes that same critical understanding of the imaging process and entrepreneurial spirit to manufacture critical metal parts with the PCM process.

More about the PCM Process.