The PCM Process

ChemArt has always been a major contributor to the Photo Chemical Machining (PCM) industry since its creation in 1976. Its founder, Richard Beaupre, was the originator of aqueous dry film photo resist used in PCM imaging applications. Currently, all dry film photo resists used in PCM applications are based on his original research. Today, ChemArt utilizes that same critical understanding of the imaging process and entrepreneurial spirit to manufacture critical metal parts with the PCM process.

Together with the Photochemical Machining Institute (PCMI), ChemArt strives to enhance the capabilities of the PCM process and create more awareness of the niche manufacturing process.

• More About PCM
• Manufacturing Process
• Advantages of the PCM Process
• Metals, Thicknesses and Tolerances
• Industrial Design Guidelines
• Typical Products
• Primary and Secondary Services
• Photochemical Machining Institute (PCMI)
• Order Fulfillment
• Request a Quote